发明名称 APPARATUS AND METHOD FOR SURFACE TREATMENT WITH PLASMA IN ATMOSPHERIC PRESSURE HAVING PARALLEL PLATES TYPE ELECTRODE STRUCTURE
摘要 An atmospheric pressure plasma surface processing apparatus having a parallel flat type electrode structure and a surface processing method thereof are provided to process efficiently surfaces of chemical active species by preventing damage due to charged particles. An atmospheric pressure plasma surface processing apparatus(100) having a parallel flat type electrode structure includes a power electrode and lower grounding electrodes(31,32). The power electrode receives a voltage. The lower grounding electrodes are installed under the power electrode. The lower grounding electrodes are opposite to the power electrode in order to form lower plasma generation spaces(41,42). A plurality of outlets(53) are formed at the lower grounding electrodes in order to discharge the plasma and the processing gas. The thickness of the lower grounding electrode is 3-50mm.
申请公布号 KR20090081828(A) 申请公布日期 2009.07.29
申请号 KR20080007915 申请日期 2008.01.25
申请人 KOREA BASIC SCIENCE INSTITUTE;SEMTECHNOLOGY CO., LTD. 发明人 LHO, TAI HYEOP;SEOK, DONG CHAN;YOO, SEUNG RUL
分类号 H05H1/24;H05H1/34;H05H1/46 主分类号 H05H1/24
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