发明名称 MICROELECTRONIC SUBSTRATE INCLUDING EMBEDDED COMPONENTS AND SPACER LAYER AND METHOD OF FORMING SAME
摘要 A microelectronic substrate, a method of forming the same, and a system including the same. The microelectronic substrate comprises: a conductive layer; a spacer layer disposed onto the conductive dielectric layer; a dielectric build-up layer disposed onto the spacer layer, the spacer layer being made of a material that has a lower shrinkage than a material of the embedding dielectric-build-up layer during curing, and a higher viscosity than a material of the embedding dielectric build-up layer in its pre-cure form and during curing; and active or passive microelectronic components embedded within the dielectric build-up layer.
申请公布号 KR20090081424(A) 申请公布日期 2009.07.28
申请号 KR20097011967 申请日期 2007.11.19
申请人 INTEL CORP. 发明人 SALAMA ISLAM;SEH HUANKIAT
分类号 H05K1/02 主分类号 H05K1/02
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