OPERATING METHOD OF SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING APPARATUS

摘要

An operating method for a substrate processing apparatus and the substrate processing apparatus are provided to safely and promptly open a door when abnormal operation is detected and to facilitate the collection of substrates placed in the substrate processing apparatus. A substrate processing apparatus comprises a polishing unit(3), a cleaning unit(4) and a returning unit(7,22). An operating method for the substrate processing apparatus comprises the following steps of: classifying substrates based on their location in the substrate processing apparatus when abnormal operation is detected; and performing treatment to the substrate in consideration of the abnormally operated units.