发明名称
摘要 A thin film forming device using a laser for reducing a facility cost and a facility area is provided to simplify a facility by arranging a sharing gas supplying unit and a sharing exhausting unit. A substrate in which the electrical defect of a pattern is discovered is placed. A plurality of thin film forming units uses the laser and deformity repairs. Gantry moves a plurality of thin film forming unit to the defect site. A share gas supply unit(460) supplies a plurality of thin film forming unit. A shared discharge unit exhausts the residual gas which is generated when a plurality of thin film unit.
申请公布号 KR100908327(B1) 申请公布日期 2009.07.17
申请号 KR20070140447 申请日期 2007.12.28
申请人 发明人
分类号 G02F1/13 主分类号 G02F1/13
代理机构 代理人
主权项
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