发明名称 |
HIGH-FREQUENCY AMPLIFICATION DEVICE AND PLASMA PROCESSING DEVICE |
摘要 |
<P>PROBLEM TO BE SOLVED: To provide a high-frequency amplification device precisely controlling output electric power to a desired value. <P>SOLUTION: A high-frequency amplifier 1 includes: an amplifier 13 which amplifies a high-frequency signal S1 of a high frequency band such as the sub-microwave band and microwave band and outputs the amplified signal to an output line 21; a directional coupler 15 which is interposed in the output line 21 to detect a progressive wave component St of the high-frequency signal S2 output by the amplifier 13 to the output line 21; and a first control unit 16 which controls the gain of the amplifier 13 based upon the progressive wave component St detected by the directional coupler 15. An isolator 14 is disposed between the amplifier 13 and the directional coupler 15 of the output line 21. <P>COPYRIGHT: (C)2009,JPO&INPIT |
申请公布号 |
JP2009159251(A) |
申请公布日期 |
2009.07.16 |
申请号 |
JP20070334487 |
申请日期 |
2007.12.26 |
申请人 |
NAGANO JAPAN RADIO CO |
发明人 |
KITO RYOJI;OKAMURA TAKEHIRO;IWAMURA TOMOAKI;KUBOTA AKIHIRO |
分类号 |
H03F3/189;B01J19/08;B08B7/00;H03F3/60;H03G3/20;H03G3/30;H05H1/46 |
主分类号 |
H03F3/189 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|