发明名称 HIGH-FREQUENCY AMPLIFICATION DEVICE AND PLASMA PROCESSING DEVICE
摘要 <P>PROBLEM TO BE SOLVED: To provide a high-frequency amplification device precisely controlling output electric power to a desired value. <P>SOLUTION: A high-frequency amplifier 1 includes: an amplifier 13 which amplifies a high-frequency signal S1 of a high frequency band such as the sub-microwave band and microwave band and outputs the amplified signal to an output line 21; a directional coupler 15 which is interposed in the output line 21 to detect a progressive wave component St of the high-frequency signal S2 output by the amplifier 13 to the output line 21; and a first control unit 16 which controls the gain of the amplifier 13 based upon the progressive wave component St detected by the directional coupler 15. An isolator 14 is disposed between the amplifier 13 and the directional coupler 15 of the output line 21. <P>COPYRIGHT: (C)2009,JPO&INPIT
申请公布号 JP2009159251(A) 申请公布日期 2009.07.16
申请号 JP20070334487 申请日期 2007.12.26
申请人 NAGANO JAPAN RADIO CO 发明人 KITO RYOJI;OKAMURA TAKEHIRO;IWAMURA TOMOAKI;KUBOTA AKIHIRO
分类号 H03F3/189;B01J19/08;B08B7/00;H03F3/60;H03G3/20;H03G3/30;H05H1/46 主分类号 H03F3/189
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