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发明名称
层积膜以及层积陶瓷电子元件之制造方法
摘要
本发明之层积膜,其特征在于具有:核层,其系以膜合成树脂构成者;及导电性脱模层,其含有至少形成于前述核层之单面之缩合反应型剥离性胶合剂以及导电性高分子,根据本发明,可提供一种层积膜,其系可良好地用于将浆料状的陶瓷原料薄片化,制造陶瓷胚片时之工程膜,可将厚度薄的陶瓷胚片安定地以均匀的厚度制造,且带电防止性以及剥离性优良。
申请公布号
TW200930568
申请公布日期
2009.07.16
申请号
TW097134526
申请日期
2008.09.09
申请人
TDK股份有限公司
发明人
饭岛忠良;饭田修治
分类号
B32B27/00(2006.01);B28B1/30(2006.01);H01G4/30(2006.01)
主分类号
B32B27/00(2006.01)
代理机构
代理人
洪澄文
主权项
地址
日本
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