发明名称 IMPROVED PLASMA SOURCE
摘要 An RF based, gridless improved plasma source and method of operating a plasma source comprising a RF coupler, a first stage with a helicon-like system, a ICH second stage, a ionization chamber, magentic means which are strengthened on the downstream end of the first stage, to control the plasma flux, ionization fraction, spatial distribution.
申请公布号 WO2008100642(A8) 申请公布日期 2009.07.16
申请号 WO2008US02381 申请日期 2008.02.19
申请人 AD ASTRA ROCKET COMPANY;CHANG DIAZ, FRANKLIN, R.;SQUIRE, JARED, P.;GLOVER, TIM, W.;CASSADY, LEONARD, D.;CARTER, MARK, D.;MCCASKILL, GREG, E. 发明人 CHANG DIAZ, FRANKLIN, R.;SQUIRE, JARED, P.;GLOVER, TIM, W.;CASSADY, LEONARD, D.;CARTER, MARK, D.;MCCASKILL, GREG, E.
分类号 H05H1/46 主分类号 H05H1/46
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