| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a substrate treatment apparatus that can efficiently determine whether a substrate under treatment at that time is nonconforming or not even if an abnormality occurs in the operation of a treatment section. <P>SOLUTION: When abnormality is detected in the operation of one of treatment units (step S3) while treatment is performed (step S2), the substrate that is treated in the treatment unit at that point is set to be a substrate to be inspected (step S4), and a series of continuous process treatment for the substrate to be inspected continue (step S5). Meanwhile, a host computer specifies inspection details according to contents of the abnormality in operation (step S6). The substrate treatment apparatus inspects the substrate to be treated where a series of treatment are completed according to the inspection contents (step S7), and a substrate where the inspected result is nonconforming is accommodated in a carrier exclusive for nonconforming substrates (step S10). <P>COPYRIGHT: (C)2004,JPO</p> |
