发明名称 MULTI SUBSTRATE PROCESSING SYSTEM AND SUBSTRATE TRANSFER EQUIPMENT THEREFOR
摘要 A multi substrate processing system and a substrate transfer device therefor are provided to process an exchange operation of processed substrates at high speed during multi substrate processes. The first support area(507) is extended in an arm neck(501) of a rotation plate arm. The second support area(508) is extended in one end of the first support area adjacent to the arm neck in the first direction. An external effecter entering area(504) is opened so that an end effecter(410) of another substrate transfer device enters through the first substrate entrance opened between a transfer chamber and the outside.
申请公布号 KR20090076495(A) 申请公布日期 2009.07.13
申请号 KR20080002479 申请日期 2008.01.09
申请人 NEW POWER PLASMA CO., LTD. 发明人 CHOI, DAI KYU
分类号 G02F1/13 主分类号 G02F1/13
代理机构 代理人
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