摘要 |
The invention relates to a method for producing a microstructure on a carrier (22), in which a carrier (22) is provided with a relief structure (26, 28) having elevations (26) and depressions (28), and in which the elevations (26) and/or depressions (26) are arranged in the form of the desired microstructure, and an imprint substance (30; 34) is transferred onto the relief structure (26, 28) by means of a printing tool, wherein the viscosity of the imprint substance (30; 34) is chosen in such a way that the imprint substance (30; 34) is transferred selectively either substantially only onto the elevations (26) or substantially only into the depressions (28) of the relief structure. |
申请人 |
GIESECKE & DEVRIENT GMBH;HOFFMUELLER, WINFRIED;BURCHARD, THEODOR;DICHTL, MARIUS;RENNER, PATRICK;RAHM, MICHAEL;HEIM, MANFRED;HOFFMANN, LARS;DOTZLER, MANFRED;LIEBLER, RALF;KELLER, MARIO |
发明人 |
HOFFMUELLER, WINFRIED;BURCHARD, THEODOR;DICHTL, MARIUS;RENNER, PATRICK;RAHM, MICHAEL;HEIM, MANFRED;HOFFMANN, LARS;DOTZLER, MANFRED;LIEBLER, RALF;KELLER, MARIO |