发明名称 SEMICONDUCTOR DEVICE AND METHOD FOR PRODUCING THE SAME
摘要 The semiconductor device includes the concentration of the impurity of the first conductivity type in a doped channel layer of a first conductivity type in the pass transistor is set at a relatively low value, and pocket regions of the first conductivity type in a pass transistor are formed so as to be relatively shallow with a relatively high impurity concentration.
申请公布号 US2009174009(A1) 申请公布日期 2009.07.09
申请号 US20090350227 申请日期 2009.01.08
申请人 FUJITSU MICROELECTRONICS LIMITED 发明人 USUJIMA AKIHIRO;KOJIMA HIDEYUKI
分类号 H01L27/088;H01L21/8232 主分类号 H01L27/088
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