发明名称 SUBSTRATE INSPECTING DEVICE, AND MANUFACTURING METHOD OF SUBSTRATE FOR MASK
摘要 PROBLEM TO BE SOLVED: To provide a substrate inspection device capable of detecting surely a fine linear flaw formed on a substrate. SOLUTION: This substrate inspection device for inspecting a foreign matter on the substrate 30 is equipped with an illumination system 1;1a, 1b for illuminating the substrate, an imaging system 2 for performing dark field observation of a domain on the substrate illuminated by the illumination system, and low reflection shielding members 3, 4 arranged on a transmission visual field background and a reflection visual field background of the imaging system. The substrate has a light transmission property, and the low reflection shielding members are arranged so as to cover the whole transmission visual field background and the whole reflection visual field background. COPYRIGHT: (C)2009,JPO&INPIT
申请公布号 JP2009150772(A) 申请公布日期 2009.07.09
申请号 JP20070328912 申请日期 2007.12.20
申请人 NIKON CORP 发明人 NAKAJIMA SHINICHI
分类号 G01N21/958;G01N21/896 主分类号 G01N21/958
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