发明名称 DEFECT CORRECTION DEVICE, DEFECT CORRECTION METHOD AND METHOD OF MANUFACTURING PATTERN SUBSTRATE
摘要 PROBLEM TO BE SOLVED: To provide a defect correction device improving the working efficiency of defect correction. SOLUTION: The defect correction device corrects a defect D generated on a substrate 6 by applying a correction material to the defect D. The device includes a plurality of correction material tanks 21 in which different correction materials are accommodated, and an application needle 5 which is provided to each correction material tank 21, projects to the substrate 6 side from an opening 21a provided below the correction material tank 21 and applies the correction material to the defect D. COPYRIGHT: (C)2009,JPO&INPIT
申请公布号 JP2009151261(A) 申请公布日期 2009.07.09
申请号 JP20080104925 申请日期 2008.04.14
申请人 LASERTEC CORP 发明人 ISHIKAWA TAKUJI;YONEZAWA MAKOTO;HASHIMOTO KAZUNORI
分类号 G02B5/20;G02F1/13 主分类号 G02B5/20
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