发明名称 METHOD FOR FORMING MULTIPLE-LAYER ELECTRODE STRUCTURE ON SOLAR CELL, METALLIZATION CONTACT STRUCTURE, PATTERNING METHOD OF LAYER, AND METHOD FOR FORMING FUNCTIONAL STRUCTURE
摘要 <p><P>PROBLEM TO BE SOLVED: To provide a method for forming a multiple-layer electrode structure for silicon solar cells. <P>SOLUTION: The method 10 for forming the multiple-layer electrode structure includes steps of: forming a conductive contact layer 20 on a semiconductor substrate 14; forming a metal bearing ink onto a portion of the conductive contact layer 20, so that the exposed portions of the conductive contact layer 20 are made adjacent to the metal bearing ink; and patterning the conductive contact layer 20 by removing the exposed portions of the conductive contact layer 20 from the semiconductor substrate 14. <P>COPYRIGHT: (C)2009,JPO&INPIT</p>
申请公布号 JP2009152589(A) 申请公布日期 2009.07.09
申请号 JP20080314442 申请日期 2008.12.10
申请人 PALO ALTO RESEARCH CENTER INC 发明人 XU BAOMIN;FORK DAVID K
分类号 H01L31/04 主分类号 H01L31/04
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