Method for manufacturing photo masks and device for implementing same

摘要

The method involves placing a photomask in a sealed enclosure, and establishing a low pressure in the enclosure by pumping a gas e.g. argon. The photo mask is subjected to an infra-red radiation, and verification is carried out if a temperature of the enclosure is equal to 50 degree Celsius. An atmospheric pressure is restored in the enclosure, and the photo mask is extracted from the enclosure to eliminate ammonia and sulfate residues after cleaning the photo mask. A protective film (4) is placed on the photo mask after eliminating the residues. An independent claim is also included for a device for manufacturing a photomask.