| 摘要 |
A plasma shielding device of a local area and a shielding method thereof are provided to control the generation of the local plasma outside a chamber by forming a horizontal or vertical shielding member with a dual structure. A plasma shielding structure protects an electrode surrounding from the plasma in a plasma processing device. The plasma shielding structure includes a horizontal shielding member(21), a vertical shielding member(27), and a rotation driving member(30). The horizontal shielding member is formed in an edge of a vertical surface of the electrode. The vertical shielding member is comprised of a plurality of pieces in a vertical surface of the electrode. The boundary of the pieces inclines based on a vertical or horizontal direction. The rotation driving unit is connected to the lower part of the vertical shielding member and rotates around the horizontal axis of the upper part of the vertical shielding member. The vertical shielding member is formed with a dual structure including the first shielding member and the second shielding member. |
