SLURRY FOR CHEMICAL MECHANICAL POLISHING AND METHOD OF MANUFACTURING THE SAME

摘要

Chemical mechanical polishing slurry is provided to improve a polishing speed of an oxide film in chemical mechanical polishing and micro scratch by optimizing a mixing ratio of a plurality of slurries. A method for manufacturing chemical mechanical polishing slurry containing abrasive particles comprises the steps of: (S100,S200) preparing plural slurry with different particle sizes of abrasive particles; and (S300) mixing a plurality of slurries. The chemical and mechanical polishing slurry is prepared by mixing a first slurry including abrasive particles having average particle size of 250-350 nm and a second slurry including abrasive particles having average particle size of 80-200 nm.