发明名称 |
METHOD OF FORMING POLYCRYSTALLINE SEMICONDUCTOR FILM, THIN FILM TRANSISTOR, AND MANUFACTURING METHOD OF THIN FILM TRANSISTOR |
摘要 |
PROBLEM TO BE SOLVED: To provide a method of forming a polycrystalline semiconductor film by which a short circuit between two adjacent TFTs can surely be prevented and the latitude of circuit design can be increased. SOLUTION: In the method of forming the polycrystalline semiconductor film crystal-grown in a first direction on an insulating substrate according to the invention, crystal growth on the insulating substrate is so controlled that crystal grains (15a) crystal-grown toward a first side and crystal grains (15b) crystal-grown toward a second side opposite from the first side collide against each other in a saw-tooth or sine-wave shape in a second direction orthogonal to the first direction. COPYRIGHT: (C)2009,JPO&INPIT
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申请公布号 |
JP2009147045(A) |
申请公布日期 |
2009.07.02 |
申请号 |
JP20070321617 |
申请日期 |
2007.12.13 |
申请人 |
ADVANCED LCD TECHNOLOGIES DEVELOPMENT CENTER CO LTD |
发明人 |
IGA DAISUKE;TANIGUCHI YUKIO |
分类号 |
H01L21/20;H01L21/336;H01L29/786 |
主分类号 |
H01L21/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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