发明名称 Batch forming system for amorphous silicon film
摘要 A batch forming system for amorphous silicon films is composed of at least one p-layer formation chamber having a sealing gate that can be opened or closed; at least one i-layer formation chamber having a sealing gate that can be opened or closed; at least one n-layer formation chamber having a sealing gate that can be opened or closed; a common vacuum chamber connected with said formation chambers; a conveyance device having a bearing surface movable to the fronts of said sealing gates respectively; and a cart for carrying a plurality of plate-shaped materials, being allowed passing through said sealing gates to enter said formation chambers respectively from said bearing surface or to exit said formation chambers and then go back to the bearing surface. Therefore, batch forming system can speedy up the production and do the batch formation of a multiplicity of the amorphous silicon films at a time.
申请公布号 US2009165705(A1) 申请公布日期 2009.07.02
申请号 US20080213313 申请日期 2008.06.18
申请人 CONTREL TECHNOLOGY CO., LTD. 发明人 YEH KUNG-HSU;HUANG MING-HUNG
分类号 C23C14/00 主分类号 C23C14/00
代理机构 代理人
主权项
地址