APPARATUS FOR SUPPLYING DEPOSITION METERIAL AND FILM DEPOSITING SYSTEM HAVING THE SAME

摘要

An apparatus for supplying deposition material and a film depositing system having the same are provided to maintain the amount of the deposition material provided to the inside of a chamber uniformly by dispersing powder inside a storage and uniforming the particle size of the deposition material of a powdered form. An apparatus(1000) for supplying deposition material comprises: a carrier gas supply part providing carrier gas; a powder storage(1200) in which the deposition material of a powdered form is stored and which provides the deposition material of the powdered form to a deposition apparatus according to the carrier gas; and a powder scattering part(1300) dispersing the deposition material of the powdered form within the powder storage. The carrier gas supply part comprises: a gas storage(1110) in which the carrier gas is stored; a flux control part(1120) controlling the flow rate of the carrier gas; a powder storage storing the carrier gas; and a plurality of pipe parts(1130) provided the carrier gas for the deposition apparatus(100).