发明名称 PHOTO-SENSOR, AND MANUFACTURING METHOD FOR THE PHOTO-SENSOR
摘要 PROBLEM TO BE SOLVED: To prevent breaking of the wires of source and drain electrodes of a photo-sensor, while taking their adhesiveness to amorphous silicon of the photo-sensor into consideration. SOLUTION: The photo-sensor having a TFT array substrate, having an element region 102 wherein thin-film transistors 101 are arranged in the form of an array has a passivation film 8 provided on the upper portion of each thin-film transistor 101, wherein each contact hole CH1 is formed and a photo diode 100 connected to a drain electrode 7 of each thin-film transistor 101 via each contact hole CH1. Each passivation film 8 and each gate insulating film 3 are removed, in a periphery region 103 existing on the outer side of the element region 102 of the TFT array substrate. Furthermore, the edge of each passivation film 8 of the periphery region 103 is formed at a position identical to or on the outside of the edge of the gate insulating film 3 of the periphery of the substrate. COPYRIGHT: (C)2009,JPO&INPIT
申请公布号 JP2009147203(A) 申请公布日期 2009.07.02
申请号 JP20070324515 申请日期 2007.12.17
申请人 MITSUBISHI ELECTRIC CORP 发明人 HAYASHI MASAMI;UCHIDA YUSUKE
分类号 H01L27/146;H01L27/14;H01L29/786;H01L31/09 主分类号 H01L27/146
代理机构 代理人
主权项
地址