METHOD FOR DEPOSITING METAL OXIDE FILMS

摘要

A method for depositing a metal oxide film on a surface of a supporting body for the film, comprising the steps of: - providing a deposition chamber; - providing a pulsed beam of electrons and plasma in the deposition chamber; - supplying a supporting body in the deposition chamber, the supporting body having a deposition surface; - providing a target body made of a material which comprises the metal oxide in the deposition chamber, the target body having a target surface; - forming a plume of metal oxide ablated from the target surface by means of the impact of the pulsed beam of electrons and plasma against the target surface; and - depositing a metal oxide film on the deposition surface by means of the contact of the plume with the deposition surface.