Process for isolating H2 and CO

摘要

Synthesis gases having a low methane content, such as those from partial oxidation, can normally not be separated into the components by means of methane scrubbing. A process for isolating H2 and CO from a synthesis gas containing these materials and small amounts of CH4 by means of scrubbing with liquid CH4 is possible when a CH4-containing gas is mixed into the liquid-phase fraction, containing CH4 and CO, of the methane scrubber prior to the rectifying separation thereof into a CO top fraction and a CH4 liquid-phase fraction (bottom fraction) which serves, at least in part, to replenish the scrubbing agent of the methane scrub.