发明名称 Electrochemical Fabrication Methods Incorporating Dielectric Materials and/or Using Dielectric Substrates
摘要 Various embodiments are directed to the electrochemical fabrication of multilayer mesoscale or microscale structures which are formed using at least one conductive structural material, at least one conductive sacrificial material, and at least one dielectric material. In some embodiments the dielectric material is a UV-curable photopolymer. In other embodiments, electrochemically fabricated structures are formed on dielectric substrates.
申请公布号 US2009165295(A1) 申请公布日期 2009.07.02
申请号 US20080233142 申请日期 2008.09.18
申请人 MICROFABRICA INC. 发明人 COHEN ADAM L.;ZHANG GANG;TSENG FAN-GANG
分类号 H05K3/00;B81B3/00;C25D5/02;G01P15/08;G01P15/125;H01P1/202;H01P3/06;H01P5/18;H01P11/00;H05K3/02;H05K3/10;H05K3/22;H05K3/46 主分类号 H05K3/00
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