发明名称 LOW-COST HIGH-CONDUCTANCE CHAMBER
摘要 <p><P>PROBLEM TO BE SOLVED: To provide a processing chamber having a high conductance and a method of manufacturing the processing chamber. <P>SOLUTION: The processing chamber is machined from a single aluminum piece and cylinders are crossed each other to form a processing cavity and a pump cavity. On the bottom of the processing cavity, a substrate opening is also formed to provide a duct line used for gas cooling, electrical connection, and so on. On the pump cavity, a large undercut area is formed between the pump cavity and the processing cavity. The undercut extends over the center line of the processing chamber on the side of the processing cavity. A material is removed using a circular saw and plenum is produced so as to extend over the center line of the processing cavity. <P>COPYRIGHT: (C)2009,JPO&INPIT</p>
申请公布号 JP2009147344(A) 申请公布日期 2009.07.02
申请号 JP20080318279 申请日期 2008.12.15
申请人 INTEVAC INC 发明人 SAMIR TUGRUL;BARNES MICHAEL S;BLUCK TERRY
分类号 H01L21/205 主分类号 H01L21/205
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