| 摘要 |
PROBLEM TO BE SOLVED: To prevent the deterioration of drawing accuracy to a field width by computing a height correction coefficient of the optimal field width to the setting of reduction ratio, when correcting the deviation of field width and rotation caused by the height variation of a drawing plane and the focus correction accompanied thereto, relating to a drawing method of an electron-beam drawing apparatus, and an electron-beam drawing apparatus. SOLUTION: In the case of drawing a pattern in a test piece using a fine pitch control drawing function and a minimum increment variable drawing function, the electron-beam drawing apparatus is constituted by including a computation control means to compute the height correction coefficient of the optimal field width to the setting of reduction rate, when correcting the deviation of field width and rotation caused by the height variation of a drawing plane and the focus correction accompanied thereto, and a drawing means to perform drawing in the test piece based on the computed height correction coefficient. COPYRIGHT: (C)2009,JPO&INPIT
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