发明名称 |
ION ASSISTED DEPOSITION METHOD FOR FORMING MULTILAYER FILM |
摘要 |
An ion assisted deposition (IAD) method for forming a film on a substrate is disclosed. The film includes a number of layers. The substrate is bombarded by an ion source with a low ion energy at a initial period of forming each of the layers and a high ion energy during a majority period of forming each of the layers after the respective initial period.
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申请公布号 |
US2009166185(A1) |
申请公布日期 |
2009.07.02 |
申请号 |
US20080189097 |
申请日期 |
2008.08.08 |
申请人 |
HON HAI PRECISION INDUSTRY CO., LTD. |
发明人 |
CHIEN SHIH-CHE |
分类号 |
C23C14/34 |
主分类号 |
C23C14/34 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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