发明名称 METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE
摘要 After a semiconductor element is formed and before resin sealing is performed, a surface of a scribe line between the adjacent semiconductor elements of a semiconductor wafer is scraped thinly. A laser is irradiated on a broken layer of the surface of the scribe line thus scraped thinly to recrystallize the broken layer.
申请公布号 US2009170288(A1) 申请公布日期 2009.07.02
申请号 US20080335861 申请日期 2008.12.16
申请人 SHINKO ELECTRIC INDUSTRIES CO., LTD. 发明人 ITO DAISUKE
分类号 H01L21/00 主分类号 H01L21/00
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