| 摘要 |
A processing system and a manufacturing method of a semiconductor device using the same are provided to prevent the excessive generation of the reaction by-product amount by steadily controlling the amount of by-product in the chamber. A supporting member(103) is arranged inside a chamber(101). A heating plate(105) is arranged on the supporting member. A wafer(110) is settled on the heating plate. The first reacting gas providing unit(161) provides the first reaction gas into the chamber. The second reacting gas providing unit(162) provides the second reaction gas into the chamber. A detection unit(140) is arranged inside the chamber and detects the amount of the by-product. The detection unit and the first reacting gas providing unit are connected to a controller(150).
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