| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a polymerizable resin composition, having adequate sensitivity to light having a wavelength of about 436 nm, about 408 nm or about 365 nm in exposure and allowing a coating film or pattern, having a high transmittance to be formed. <P>SOLUTION: The polymerizable resin composition contains an alkali-soluble resin (A), a polymerizable compound (B), an initiator (C), an auxiliary initiator (D) and a solvent (E), wherein the auxiliary initiator (D) is a compound containing a compound represented by at least one which is selected from among a group consisting of formula (I-1) and formula (I-2). <P>COPYRIGHT: (C)2009,JPO&INPIT |
