发明名称 NONVOLATILE MEMORY ELEMENT, PROCESS FOR PRODUCING THE NONVOLATILE MEMORY ELEMENT, AND NONVOLATILE MEMORY DEVICE USING THE NONVOLATILE MEMORY ELEMENT
摘要 <p>This invention provides a nonvolatile memory element that can be operated at a high speed and, at the same time, has reversibly stable rewrite characteristics and good resistance retention characteristics, a process for producing the nonvolatile memory element, and a nonvolatile memory device using the nonvolatile memory element. The nonvolatile memory element comprises a first electrode layer (103), a second electrode layer (105), and a resistance change layer (104) which is interposed between the first electrode layer (103) and the second electrode layer(105) and undergoes a reversible change in resistance based on an electrical signal applied between the first electrode layer (103) and the second electrode layer (105). The resistance change layer (104) is constructed so that the resistance change layer (104) comprises a tantalum oxide containing at least a transition metal oxide different from tantalum and satisfies the requirement that the tantalum oxide containing the transition metal oxide different from tantalum is represented by TaxMyOz wherein 0 < y/x < 1 and 0.5 = z/(x + y) = 1.9.</p>
申请公布号 WO2009078172(A1) 申请公布日期 2009.06.25
申请号 WO2008JP03798 申请日期 2008.12.16
申请人 PANASONIC CORPORATION;FUJII, SATORU;TAKAGI, TAKESHI 发明人 FUJII, SATORU;TAKAGI, TAKESHI
分类号 H01L27/10;G11C13/00;H01L45/00;H01L49/00 主分类号 H01L27/10
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