THIN FILM MAINLY COMPOSED OF TITANIUM OXIDE, SINTERED SPUTTERING TARGET SUITABLE FOR THE PRODUCTION OF THIN FILM MAINLY COMPOSED OF TITANIUM OXIDE, AND METHOD FOR PRODUCTION OF THIN FILM MAINLY COMPOSED OF TITANIUM OXIDE

摘要

Disclosed is a thin film mainly composed titanium oxide, which comprises 29.6 to 34.0 at% (inclusive) of Ti and 0.003 to 7.4 at% (inclusive) of Ag, with the remainder being O (oxygen), wherein the ratio of oxygen to the metal components [i.e., O/(2Ti+0.5 Ag)] is 0.97 or more. It becomes possible to provide: a thin film mainly composed of titanium oxide, which has a high refractive index and a low extinction coefficient; a sintered sputtering target which is mainly composed of titanium oxide and which is suitable for the production of the thin film; and a method for producing a thin film mainly composed of titanium oxide. It also becomes possible to provide a thin film which has excellent permeability, which is hardly reduced in its reflectance, and which is useful as an interference film or a protective film for an optical information recording medium. The thin film can be applied to a glass substrate; namely the thin film can be used as a heat ray-reflective film, an antireflection film or an interference film.