发明名称 PHOTOMASK MOUNTING/HOUSING DEVICE AND RESIST INSPECTION METHOD AND RESIST INSPECTION APPARATUS USING SAME
摘要 <p>A photomask mounting/housing device, a resist inspecting method using the same, and a resist inspection apparatus using the same are provided to maintain performance of an optic system by preventing leakage of gas to the outside. A photomask mounting/housing device includes a plurality of frame bodies and a light-transmitting protection member. Each of the frame bodies includes a concave part and a cavity part(9h,10h). The concave part is formed to receive the photomask. The concave part is formed to house the photomask. The cavity part is formed within the concave part. At least, a resist forming region of the photomask is inserted into the cavity part. The light-transmitting protection member is arranged at the outside of the cavity part of the frame body. A sealed space is formed to oppose the resist and to be separated from the resist.</p>
申请公布号 KR20090068167(A) 申请公布日期 2009.06.25
申请号 KR20080130346 申请日期 2008.12.19
申请人 NEC CORPORATION 发明人 KATOU YOSHIKAZU;IGETA TAKAHIRO;MORIBE HIDEYUKI;HASEGAWA RYUJI
分类号 H01L21/027;G03F1/84 主分类号 H01L21/027
代理机构 代理人
主权项
地址