发明名称 MULTILAYER THIN FILM EXECUTION EQUIPMENT AND EXECUTION METHOD OF USING OF THE SAME
摘要 A multilayer thin film manufacturing system and a manufacturing method of a multilayer thin film using the same are provided to perform continuously a surface modification process and a sputtering process by forming different degrees of vacuum adapted for surface modification and sputtering in an internal space of a vacuum chamber. A vacuum chamber(110) provides a work space for forming multiple thin films on a soft film. A vacuum forming unit(120) forms vacuum in the inside of the vacuum chamber. A film supply roller(130) supplies the soft film in the inside of the vacuum chamber. A surface modification unit(140) modifies a surface of the soft film. A plurality of thin film forming units(150) forms one surface of the soft film having the modified surface. A plurality of cooling rollers(160) correspond to the thin film forming units. The cooling rollers are used for cooling the heat of the soft film. A transfer guide roller(170) is installed between the cooling rollers in order to guide a transferring direction of the soft film. A thin film winding roller(180) is formed to wind a multilayer thin film. The vacuum chamber includes a plurality of spaces having different degrees of vacuum.
申请公布号 KR20090067288(A) 申请公布日期 2009.06.25
申请号 KR20070134867 申请日期 2007.12.21
申请人 KOREA INSTITUTE OF MACHINERY & MATERIALS 发明人 LEE, GUN HWAN;LEE, SUNG HOON;PARK, CHANG HA;LEE, HAK JUN
分类号 H01L21/203;H01L21/02 主分类号 H01L21/203
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