| 摘要 |
PROBLEM TO BE SOLVED: To provide a substrate support which reduces the resistance of an embedded electrode to enable the uniform generation of plasma. SOLUTION: The substrate support includes: a ceramic base 12 having an upper surface on which a substrate is placed; a first conductive body 16 having a plate-type body, composed of a conductive paste that is sintered, and embedded in an upper side of the ceramic base 12; a second conductive body 18 having a meshed-type body, provided inside the ceramic base 12, and being in contact with a lower surface of the first conductive body 16; and an electrode terminal 20 penetrating a part of the ceramic base 12 from a lower surface of the ceramic base 12 and is connected to the second conductive body 18. COPYRIGHT: (C)2009,JPO&INPIT
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