发明名称 Parallel electron beam lithography stamp (PEBLS)
摘要 An array of vertically aligned electron emitting nanotips such as multiwall carbon nanotubes are formed and patterned for use as a lithographic stamp. The spacing and/or arrangement of the nanotips correspond to a predetermined pattern that is desired to be formed on an opposing substrate. Simultaneous actuation of the nanotips by a common electrode forms a pattern on the opposing substrate without any necessary scanning techniques or use of masks. Applying a sufficient electrical potential between the array and the substrate generates electron emission from the tips so as to cure a resist, produce localized electrochemical reactions, establish localized electrostatic charge distributions or perform other desirable coating or etching process steps so as to create nanoelectronic circuitry or to facilitate molecular or nanoscale processing.
申请公布号 US7550747(B2) 申请公布日期 2009.06.23
申请号 US20060395238 申请日期 2006.04.03
申请人 MOUTTET BLAISE LAURENT 发明人 MOUTTET BLAISE LAURENT
分类号 B05D1/04 主分类号 B05D1/04
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