发明名称 SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF
摘要 <p>A disclosed semiconductor device includes a semiconductor substrate including semiconductor integrated circuit forming areas; semiconductor integrated circuits formed on the semiconductor integrated circuit forming areas; and an alignment pattern formed on a periphery of at least one of the semiconductor integrated circuit forming areas.</p>
申请公布号 KR100904197(B1) 申请公布日期 2009.06.23
申请号 KR20070085468 申请日期 2007.08.24
申请人 发明人
分类号 H01L21/027 主分类号 H01L21/027
代理机构 代理人
主权项
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