发明名称 Grating for EUV-radiation, method for manufacturing the grating and wavefront measurement system.
摘要 A grating for EUV-radiation includes a plurality of reflecting lines. Each reflecting line includes a plurality of first reflecting dots, and a plurality of second reflecting dots arranged between each other. The first reflecting dots and the second reflecting dots are configured to reflect EUV-radiation with a mutual phase difference of 180±10 degrees mod 360 degrees.
申请公布号 NL1036305(A1) 申请公布日期 2009.06.23
申请号 NL20081036305 申请日期 2008.12.11
申请人 ASML NETHERLANDS B.V. 发明人 BORGERT KRUIZINGA;MARTIJN GERARD DOMINIQUE WEHRENS;MICHIEL DAVID NIJKERK;KORNELIS FRITS FEENSTRA
分类号 G01M11/02;G03F7/20 主分类号 G01M11/02
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