发明名称 |
Grating for EUV-radiation, method for manufacturing the grating and wavefront measurement system. |
摘要 |
A grating for EUV-radiation includes a plurality of reflecting lines. Each reflecting line includes a plurality of first reflecting dots, and a plurality of second reflecting dots arranged between each other. The first reflecting dots and the second reflecting dots are configured to reflect EUV-radiation with a mutual phase difference of 180±10 degrees mod 360 degrees. |
申请公布号 |
NL1036305(A1) |
申请公布日期 |
2009.06.23 |
申请号 |
NL20081036305 |
申请日期 |
2008.12.11 |
申请人 |
ASML NETHERLANDS B.V. |
发明人 |
BORGERT KRUIZINGA;MARTIJN GERARD DOMINIQUE WEHRENS;MICHIEL DAVID NIJKERK;KORNELIS FRITS FEENSTRA |
分类号 |
G01M11/02;G03F7/20 |
主分类号 |
G01M11/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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