发明名称 Radiation source, lithographic apparatus and device manufacturing method.
摘要 A radiation source is configured to generate radiation. The radiation source includes a first electrode and a second electrode configured to produce an electrical discharge during use to generate radiation-emitting plasma from a plasma fuel. The radiation source also includes a fuel supply configured to supply a plasma fuel to a fuel release area that is associated with the first electrode and the second electrode, and a fuel release configured to induce release of fuel, supplied by the fuel supply, from the fuel release area. The fuel release area is spaced-apart from the first electrode and from the second electrode.
申请公布号 NL1036272(A1) 申请公布日期 2009.06.22
申请号 NL20081036272 申请日期 2008.12.03
申请人 ASML NETHERLANDS B.V. 发明人 VADIM YEVGENYEVICH BANINE;MAARTEN MARINUS JOHANNES WILHELMUS VAN HERPEN;WOUTER ANTHON SOER
分类号 H05G2/00;G03F7/20 主分类号 H05G2/00
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