发明名称 SUBSTRATE TREATING APPARATUS
摘要 PROBLEM TO BE SOLVED: To provide a substrate treating apparatus capable of suppressing an excessive rise in siloxane concentration in an aqueous phosphoric acid solution in a treating tank. SOLUTION: The aqueous phosphoric acid solution which is discharged from the treating tank and contains siloxane is cooled by a heat exchanger 51 and supplied to a reaction tank 60. The reaction tank 60 is fed with mixed liquid of dodecane and a TOPO extractant from a separatory tank 80, and the aqueous phosphoric acid solution and dodecane are mixed and stirred in the reaction tank 60, so that the siloxane in the aqueous phosphoric acid solution is extracted by the TOPO extractant and gets into the dodecane. Then the mixed liquid in the reaction tank 60 is sent out to a liquid-liquid centrifugal separator 70 to be centrifugally separated into the aqueous phosphoric acid solution having relatively large specific gravity and light liquid having small specific gravity and containing the dodecane and TOPO extractant. The separated aqueous phosphoric acid solution is fed to the treating tank again. COPYRIGHT: (C)2009,JPO&INPIT
申请公布号 JP2009130032(A) 申请公布日期 2009.06.11
申请号 JP20070301672 申请日期 2007.11.21
申请人 DAINIPPON SCREEN MFG CO LTD 发明人 KIYOSE HIROMI;HAYASHI TOKUYUKI
分类号 H01L21/306 主分类号 H01L21/306
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