发明名称 PLASMA SOURCES HAVING FERRITE STRUCTURES AND PLASMA GENERATING APPARATUS EMPLOYING THE SAME
摘要 A plasma source and a plasma generating apparatus using the same are provided to concentrate a field of a radial shape to a substrate to be treated by mounting a ferrite structure on a linear type antenna. One linear antenna(21) forms a loop type by connecting one side of a first antenna of a linear type to one side of a second antenna of a linear type. A ferrite structure(23a) is positioned in each top part of the first antenna and the second antenna of the linear antenna. The ferrite structure concentrates a field formed into a radial type from the antenna to a specific direction. The ferrite structure is formed into an arch type.
申请公布号 KR20090059884(A) 申请公布日期 2009.06.11
申请号 KR20070126968 申请日期 2007.12.07
申请人 SUNGKYUNKWAN UNIVERSITY FOUNDATION FOR CORPORATE COLLABORATION 发明人 YEOM, GEUN YOUNG;KIM, KYONG NAM;LIM, JONG HYEUK;PARK, JUNG KYUN
分类号 H05H1/24;H05H1/30;H05H1/34;H05H1/40 主分类号 H05H1/24
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