发明名称 |
PLASMA SOURCES HAVING FERRITE STRUCTURES AND PLASMA GENERATING APPARATUS EMPLOYING THE SAME |
摘要 |
A plasma source and a plasma generating apparatus using the same are provided to concentrate a field of a radial shape to a substrate to be treated by mounting a ferrite structure on a linear type antenna. One linear antenna(21) forms a loop type by connecting one side of a first antenna of a linear type to one side of a second antenna of a linear type. A ferrite structure(23a) is positioned in each top part of the first antenna and the second antenna of the linear antenna. The ferrite structure concentrates a field formed into a radial type from the antenna to a specific direction. The ferrite structure is formed into an arch type. |
申请公布号 |
KR20090059884(A) |
申请公布日期 |
2009.06.11 |
申请号 |
KR20070126968 |
申请日期 |
2007.12.07 |
申请人 |
SUNGKYUNKWAN UNIVERSITY FOUNDATION FOR CORPORATE COLLABORATION |
发明人 |
YEOM, GEUN YOUNG;KIM, KYONG NAM;LIM, JONG HYEUK;PARK, JUNG KYUN |
分类号 |
H05H1/24;H05H1/30;H05H1/34;H05H1/40 |
主分类号 |
H05H1/24 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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