| 摘要 |
A mixture supply apparatus and a substrate treating facility including the same are provided to minimize a discharge amount of ozonated water mixture by measuring concentration of the ozonated water mixture of each distribution line. A first treating liquid supply line(32) supplies a first treating liquid. A second treating liquid supply line(34) supplies a second treating liquid. A mixing line(36) generates a mixture by mixing the first treating liquid to the second treating liquid. A manifold(42) receives the mixture generated by the mixing line. A plurality of distribution lines(44a,44b,44c,44d) supplies the mixture to a plurality of process units(100a,100b,100c,100d). A concentration check line(46) is branched from a distribution line(44). A concentration meter(48) is installed on the concentration check line, and measures concentration of the mixture flowing to the concentration check line.
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