| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a photomask such as a gray tone mask capable of suppressing generation of dielectric breakdown in a pattern which can occur, upon handling a mask during being used, and preventing influencing the mask pattern to be used for formation of a device, even in the event of an occurrence of a dielectric breakdown. <P>SOLUTION: The photomask (gray tone mask) includes a mask pattern on a transparent substrate 24, the pattern for forming a desired transfer pattern onto a transfer object, and includes conductive patterns 11a and 11b, 11c and 11d, 12a and 12b, 12c, and 12d drawn from each of a plurality of electrically isolated mask patterns 10a, 10b, 10c. These conductive patterns are not in contact with one another, but rather have portions close to one another with an interval between them being smaller than that between the mask patterns, and are formed of a semi-translucent film or a translucent film. <P>COPYRIGHT: (C)2009,JPO&INPIT |
