Trägersubstrat zur Abscheidung eines Films und Bereitstellung eines Phasenschiebermaskenrohlings
摘要
For the manufacture of a halftone phase shift mask blank comprising a transparent substrate and a translucent film of one or more layers having a controlled phase and transmittance, at least one layer of the translucent film comprising Si, Mo and Zr at the same time, a target comprising at least Zr and Mo in a molar ratio Zr/Mo between 0.05 and 5 is useful.
申请公布号
DE602005014163(D1)
申请公布日期
2009.06.10
申请号
DE20056014163T
申请日期
2005.03.31
申请人
SHIN-ETSU CHEMICAL CO. LTD.;TOPPAN PRINTING CO. LTD.