摘要 |
<p>Disclosed is a composition for forming a base film for lithography, which enables a base film for lithography to have excellent optical characteristics and excellent etching resistance. Also disclosed are a base film made from such a composition and having high refractive index (n), low extinction coefficient (k), adequate transparency, high etching resistance and an extremely small sublimation content, and a pattern-forming method using such a base film. The composition for forming a base film contains an organic solvent and a naphthalene formaldehyde polymer having a specific unit, which is obtained by reacting at least naphthalene and/or an alkylnaphthalene with formaldehyde.</p> |
申请人 |
MITSUBISHI GAS CHEMICAL COMPANY, INC.;OGURO, DAI;HIGASHIHARA, GO;KITA, SEIJI;KITAMURA, MITSUHARU;OGIWARA, MASASHI |
发明人 |
OGURO, DAI;HIGASHIHARA, GO;KITA, SEIJI;KITAMURA, MITSUHARU;OGIWARA, MASASHI |