发明名称 |
METHOD FOR REDUCING SIDE LOBE PRINTING USING A BARRIER LAYER |
摘要 |
A method suitable for reducing side lobe printing in a photolithography process is enabled by the use of a barrier layer on top of a photoresist on a substrate. The barrier layer is absorbing at the imaging wavelength of the underlying photoresist and thus blocks the light from reaching the photoresist. A first exposure followed by a development in an aqueous base solution selectively removes a portion of the barrier layer to reveal a section of the underlying photoresist layer. At least a portion of the revealed section of the photoresist layer is then exposed and developed to form a patterned structure in the photoresist layer. The barrier layer can also be bleachable upon exposure and bake in the present invention.
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申请公布号 |
US2009142704(A1) |
申请公布日期 |
2009.06.04 |
申请号 |
US20070949190 |
申请日期 |
2007.12.03 |
申请人 |
INTERNATIONAL BUSINESS MACHINES CORPORATION |
发明人 |
CHEN KUANG-JUNG;HUANG WU-SONG;LI WAI-KIN |
分类号 |
G03F7/00 |
主分类号 |
G03F7/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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