发明名称 SEMICONDUCTOR APPEARANCE INSPECTION DEVICE AND INSPECTION METHOD
摘要 PROBLEM TO BE SOLVED: To improve the throughput and inspection image quality of an electron beam type inspection device, and to shorten the swing return time of an output waveform of a deflection control circuit. SOLUTION: When a function of changing the scan mode on a GUI screen according to the charging characteristic of a specimen to be inspected is performed, and in the swing return period of a deflection signal that conventionally does not obtain an image according to a specific inspection condition such as the scan mode, inspection field of view, pixel size, and optical condition, the specimen having a registered pattern is radiated to obtain an image. After acquiring, a swing return analog waveform of the deflection signal is converted, the analog waveform is compared with an ideal swing return waveform, and correction data is extracted. The correction data is input into a deflection waveform data generating section, and the deflection waveform data generation is performed so that the actual waveform approaches the ideal waveform, thereby shortening the swing return period. COPYRIGHT: (C)2009,JPO&INPIT
申请公布号 JP2009122055(A) 申请公布日期 2009.06.04
申请号 JP20070298782 申请日期 2007.11.19
申请人 HITACHI HIGH-TECHNOLOGIES CORP 发明人 RI UEN;TAKAHASHI MASAYOSHI;IMAGAWA KENGO;ORIHASHI RITSURO;GUNJI YASUHIRO;FUNATSU RYUICHI
分类号 G01N23/225;H01J37/147;H01J37/24;H01L21/66 主分类号 G01N23/225
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