发明名称 Semiconductor element and process for producing the same
摘要 The present invention provides a thin film transistor having excellent formability and processability, and particularly a thin film transistor using plastics as a substrate; an organic semiconductor as an active layer; and SiO2 thin films formed by coating as a sealing layer and a gate insulating layer, and a process for producing the same. The present invention provides a field-effect type thin film transistor having an active layer of an organic semiconductor, comprising on a plastic substrate, a sealing layer of a SiO2 thin film formed by coating; a gate electrode; a gate insulating layer of a SiO2 thin film formed by coating; gate and drain electrodes; and a semiconductor active layer. The high-quality SiO2 thin film is obtained by using a silicon compound as a starting material and irradiating a coated thin film of the solution of the starting material with light in an oxygen atmosphere.
申请公布号 US2009140235(A1) 申请公布日期 2009.06.04
申请号 US20050659105 申请日期 2005.08.19
申请人 NATIONAL INSTITUTE OF ADVANCE INDUSTRIAL SCIENCE AND TECHNOLOGY 发明人 KAMATA TOSHIHIDE;KOZASA TAKEHITO
分类号 H01L51/30;H01L21/31 主分类号 H01L51/30
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