发明名称 METHOD FOR MANUFACTURING SUBSTRATE FOR LIQUID CRYSTAL DISPLAY DEVICE, AND PHOTOMASK USED THEREFOR, AND LIQUID CRYSTAL DISPLAY DEVICE
摘要 <P>PROBLEM TO BE SOLVED: To provide a method for manufacturing a liquid crystal display device, in which a color filter having a contact hole of &le;10 &mu;m in diameter is disposed on the array substrate. <P>SOLUTION: The method for manufacturing the liquid crystal display device comprises: a step (a) to form a photosensitive composition layer by using a negative photosensitive coloring composition; a step (b) to form the contact hole with the opening diameter of 1.0 to 10.0 &mu;m and a latent image of the color filter layer on the photosensitive composition layer with proximity exposure by using a photomask of which the pattern corresponding to the contact hole is an internal void pattern formed by dividing the pattern into nine quadrilaterals wherein at least four or more of the quadrilaterals are non-light shielding sections or the center quadrilateral is a non-light shielding section; and a step (c) to develop and heat-fix the photosensitive composition with the latent image, on an array substrate, having a switching element to drive a liquid crystal and a pixel electrode connected thereto. <P>COPYRIGHT: (C)2009,JPO&INPIT
申请公布号 JP2009122491(A) 申请公布日期 2009.06.04
申请号 JP20070297752 申请日期 2007.11.16
申请人 TOPPAN PRINTING CO LTD 发明人 SHIMIZU MIE;MINATO KOICHI
分类号 G02F1/1335;G02B5/20;G02F1/1368 主分类号 G02F1/1335
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