发明名称 SUBSTRATE WITH PLANE PATTERNS
摘要 A substrate with plane patterns formed in a liquid process wherein the plane patterns are formed based on a combination of plane shapes by which a difference in internal pressure of a solution between any two points of the solution is small, the solution being ejected onto the substrate so as to form the plane patterns by the liquid process.
申请公布号 KR100900617(B1) 申请公布日期 2009.06.02
申请号 KR20050084809 申请日期 2005.09.12
申请人 发明人
分类号 G02F1/1343 主分类号 G02F1/1343
代理机构 代理人
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